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Vacuum Plating Thin Film Magnetron Sputtering PVD Coating Systems
Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. The device is equipped with three 300W RF power supply, which can be used for the preparation of non-metal. The three targets can meet the needs of multi-layer or multiple coatings.
The machine is equipped with two-channel high-precision mass flowmeter. The instrument features advanced turbomolecular pump sets with ultimate vacuum up to 1.0E-5Pa. Molecular pump gas path is controlled by multiple solenoid valves, allowing users to open the chamber to take out samples without shutting down the pump, greatly improving work efficiency.
Used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and more. It is an ideal equipment for material films research in laboratory settings due to its small size and easy operation.
| Sample stage | Size: φ185mm | Accuracy: ±1ºC |
| Heating: Max 500ºC | Rotate speed: 1-20rpm | |
| Target head | Quantity: 2"×3 (1",2" optional) | Water chiller: 10L/min |
| Cooling: Water cooling | - | |
| Vacuum chamber | Size: φ300mm×300mm | Watch window: φ100mm |
| Material: Stainless steel | Opening: Top cover open | |
| Vacuum system | Ultimate vacuum: 1.0E-5Pa | Molecular pump: 600L/S |
| Power | RF power supply ×3 | Max output: RF 300 W |
| Other | Size: 600mm×650mm×1280mm | Weight: 300kg |
