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| Customization: | Available |
|---|---|
| After-sales Service: | Onlin |
| Warranty: | 1 |
CVD ALD Atomic Layer Deposition System for Powder Coating Plating
The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale industrial experiments. Fully compliant with CE criteria, it is widely utilized in micro-electronics, nano-materials, optical films, and solar battery technology.
⭐ Key Product Benefits:
Advanced software controlling system: Integrated functions including technological formulation, parameter setting, popedom setting, interlocking alarming, and state supervisory control.
Supported ALD Films:
Application Fields:
| Wafer Dimension | 8 inch and below |
| Wafer Temperature | RT-400ºC, Precision ±0.1ºC |
| Number of Precursor | Three precursor lines (Optional more) |
| Precursor Line Temp | RT-200ºC, Precision ±0.1ºC |
| Source Bottle Temp | RT-200ºC, Precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Background Vacuum | <5*10-3 Torr |
| Gas Carrier System | N2 or Ar |
| Growing Mode | Consecutive or interval deposition mode |
| Controlling System | PLC plus touch screen or display |
| Power Supply | 50-60Hz, 220V/20A AC |
| Deposition Heterogeneity | Heterogeneity <±1% |
| Instrument Dimension | 600mm x 600mm x 1100mm |






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